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 HOME >Tool's Information |
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Tool's Specification.
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Tool Name
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Nanometrics Nanospec 2100 Thin Film Thickness measurement |
| Model |
2100 |
Maker |
NANOMETRICS |
| Wafer Size |
8"
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Vintage |
1996-11 |
| Sell Status |
SELL
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Tool's Condition |
Refurbishing
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| Description |
*. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.
*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
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- Address:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- Phone:
82-41-554-6920~1 FAX: 82-41-554-6922
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