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 HOME >Tool's Information |
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Tool's Specification.
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Tool Name
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N&K 8000 CD Trench Depth & Thin film thickness Measurement |
| Model |
N&K Little foot 8000 CD |
Maker |
N&K |
| Wafer Size |
8"
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Vintage |
2007- |
| Sell Status |
SELL
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Tool's Condition |
Operational
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| Description |
Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers
DUV - Vis - NIR: 190nm to 1000nm
Reflectance, Polarized
Analyzer Unit with spot size : 50 um
Cognex Pattern Recognition Software
Windows 7 Operating System
S/W Version : 10.5.3.0
n&k's Thin Film Characterization S/W
n&k's Standard Films Library
Automated Wafer Loading/Unloading
Assyst Loadport for 8" Wafers
Computerized X-Y stage for full wafer mapping,and wafer alignment capability
Z-stage to acccommodate multiple substrate thickness
SEMI and CE Certification
Application :
Simultaneously determines thickness, n and k of thin films including semiconductors,dielectronics (SiO2, Si3N4),etc, Polymers (Photoresist,etc),and very thin metals
- Thin Film : Film Thickness / n and k
- OCD : Depth / CD / Profile
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- Address:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- Phone:
82-41-554-6920~1 FAX: 82-41-554-6922
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