|
|
|
HOME >设备信息 |
设备信息
|
设备名称
|
KLA-Tencor OSA 6100 Optical Defect Inspection |
型号 |
OSA6100 |
制造商 |
KLA TENCOR |
晶元尺寸 |
6"
|
Vintage |
2005-9 |
销售状态 |
销售中
|
设备状态 |
Refurbishing
|
数据 |
[ General Description ]
Wafer Size : 2 ~ 6 inch
Illumination Source : 25 mW laser, 405 nm wavelength
Operator Interface : Trackball and keyboard standard
Substrate Thickness : 350 μm ~ 1,100 μm
Substrate Material : Any clear or opaque polished surface
[ Performance ]
Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si)
Other Defects and Applications : Particles, scratches, stains, pits, and bumps.
Sensitivity: Minimum detectable size for automatic defect classification:
- Scratches: 100 μm long, 0.1 μm wide, 50 Å; deep.
- Pits: 20 μm diameter, 50 Å; deep
- Stains: 20 μm diameter, 10 Å; thick
[ Application ]
- Disk substrates |
|
|
|
|
- 总公司:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- 电话:
82-41-554-6920~1 传真: 82-41-554-6922
|
|
|