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设备信息
设备名称 KLA-Tencor Candela CS20 Optical Defect Inspection
型号 CS20 制造商 KLA TENCOR
晶元尺寸 6" Vintage 2006-2
销售状态 销售中 设备状态 Refurbishing
数据 [ General Description ]
Wafer Size : 2 ~8 inch
Illumination Source : 8mW laser, 635 nm wavelength
Operator Interface : Trackball and keyboard standard
Substrate Thickness : 350 μm ~ 1,100 μm
Substrate Material : Any clear or opaque polished surface


[ Performance ]
Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si)
Other Defects and Applications : Particles, scratches, stains, pits, and bumps.
Sensitivity: Minimum detectable size for automatic defect classification:
- Scratches: 100 μm long, 0.1 μm wide, 50 Å; deep.
- Pits: 20 μm diameter, 50 Å; deep
- Stains: 20 μm diameter, 10 Å; thick

[ Application ]
- Opaque substrates
- EPI Layers
- Transparent film coatings (SiC, GaN, Sapphire)
  - 总公司: 3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
   - 电话: 82-41-554-6920~1 传真: 82-41-554-6922