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 HOME >设备信息 |
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设备信息
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设备名称
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Nanometrics Nanospec 210 Thin Film Thickness measurement |
| 型号 |
210 |
制造商 |
NANOMETRICS |
| 晶元尺寸 |
8"
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Vintage |
- |
| 销售状态 |
销售中
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设备状态 |
Refurbishing
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| 数据 |
*. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.
*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
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- 总公司:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- 电话:
82-41-554-6920~1 传真: 82-41-554-6922
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