|
|
|
|
|
 HOME >设备信息 |
|
设备信息
|
|
设备名称
|
Nanometrics Nanospec 2100 Thin Film Thickness measurement |
| 型号 |
2100 |
制造商 |
NANOMETRICS |
| 晶元尺寸 |
8"
|
Vintage |
1996-11 |
| 销售状态 |
销售中
|
设备状态 |
Refurbishing
|
| 数据 |
*. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.
*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
|
|
|
|
|
|
- 总公司:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- 电话:
82-41-554-6920~1 传真: 82-41-554-6922
|
|
|
