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 HOME >设备信息 |
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设备信息
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设备名称
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N&K 5300 CD Trench Depth & Thin film thickness Measurement |
| 型号 |
NK5300 |
制造商 |
N&K |
| 晶元尺寸 |
12"
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Vintage |
2006-3 |
| 销售状态 |
销售中
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设备状态 |
Refurbishing
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| 数据 |
Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers
DUV - Vis - NIR: 190nm to 1000nm
Reflectance, Polarized Analyzer Unit with spot size : 50 um
Cognex Pattern Recognition Software
n&k's Thin Film Characterization S/W
n&k's Standard Films Library
Automated Wafer Loading/Unloading
Brooks Loadport for 12" Wafers
Computerized X-Y stage for full wafer mapping,and wafer alignment capability
Z-stage to acccommodate multiple substrate thickness
SEMI and CE Certification
Application :
Simultaneously determines thickness, n and k of thin films including semiconductors,dielectronics (SiO2, Si3N4),etc, Polymers (Photoresist,etc),and very thin metals
- Thin Film : Film Thickness / n and k
- OCD : Depth / CD / Profile
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- 总公司:
3, Tongjeong 3-ro, Dongnam-gu, Cheonan-si, Chungcheongnam-do, Korea ,31208
- 电话:
82-41-554-6920~1 传真: 82-41-554-6922
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