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Àåºñ¸í Nanometrics Nanospec 210 Thin Film Thickness measurement
¸ðµ¨¸í 210 Á¦Á¶»ç NANOMETRICS
¿þÀÌÆÛ»çÀÌÁî 8" Vintage -
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Á¦¿ø *. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.

*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
     
  - Ãæû³²µµ õ¾È½Ã µ¿³²±¸ ÅëÁ¤3·Î 3 (ÁÖ)Á¦³×½Ã½º ¿ì)31208 TEL: 041-554-6920~1 FAX: 041-554-6922