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Àåºñ¸í Nanometrics Nanospec 2100 Thin Film Thickness measurement
¸ðµ¨¸í 2100 Á¦Á¶»ç NANOMETRICS
¿þÀÌÆÛ»çÀÌÁî 8" Vintage 1996-11
¸Å¸Å»óÅ ÆǸÅÁß Àåºñ»óÅ ¼ö¸®Áß
Á¦¿ø *. Process: Film thickness measurement.
- silicon dioxide on silicon 400~ 30,000 A.
- photo resist on silicon 500~ 40,000 A.
- other thin films.

*. Hardware configuration:
- Optical microscope & objectives 5x,10x,40x.
- Spectrophotometer Head.
- Microcomputer & Monitor.
- Photo intensity Display & Wavelength counter.
- Microscope Stage.
*. Wavelength : 390~800 nm TungstenLamp 12V /50W.
       
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